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DE200 PLD 北京高校光學(xué)實(shí)驗(yàn)室DE200脈沖激光薄膜沉積系統(tǒng)

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  • 公司名稱 德儀科技有限公司
  • 品牌
  • 型號(hào) DE200PLD
  • 所在地 北京市
  • 廠商性質(zhì) 代理商
  • 更新時(shí)間 2016/1/11 18:00:00
  • 訪問次數(shù) 936

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德儀科技有限公司專業(yè)進(jìn)口美國磁控濺射、電子束蒸發(fā)、熱蒸發(fā)和脈沖激光真空薄膜沉積設(shè)備,以及磁控濺射源/電源、電子束蒸發(fā)源、濺射靶材和蒸發(fā)材料等。十幾年來,憑著的品質(zhì),*的技術(shù)和周到的技術(shù)服務(wù),德儀公司的產(chǎn)品為中國的高校、科研院所及企業(yè)的薄膜沉積工作提供了有力的支持。

我們期待為您提供您使用的真空薄膜沉積設(shè)備和部件!

詳細(xì)信息 在線詢價(jià)


  •  
  • 超高真空脈沖激光沉積腔室
  • 超高真空STM腔室
  • 超高真空樣品操縱臺(tái)
  • 多靶轉(zhuǎn)臺(tái)
  • 預(yù)真空進(jìn)樣室

Typical PLD System Configuration and Variations

1. Typical PLD Configuration
The substrate and target are introduced through a load lock chamber opposite the target gearbox. The substrate is then rotated on its polar axis to face the target gearbox. The substrate can be moved out of the way for transfer of the targets. This is one of the most common and economical configurations.

Typical PLD configuration, vertically-mounted substrate manipulator

Typical PLD substrate manipulator with 2" quartz lamp heater

Typical PLD target manipulator, horizontal mount, STLC target system

2. Vertical PLD Configuration
This design features up-facing, gravity-held target holders to accommodate liquid, powder, or conventional targets. A custom transfer fork moves substrates and targets into place via standard load lock chamber.

3. Simple PLD Configuration
This design offers basic substrate and target devices with no XY or Z adjustment. Substrate and target changes are done at atmosphere.

4. Multi-Purpose PLD Configuration
This design permits MBE growth, via bottom-flange-mounted evaporation sources, as well as PLD growth. Substrate assembly faces the side of the chamber for PLD, the bottom for MBE, and the other side for in-vacuum transfer of substrates.

PLD Components

PLD substrate manipulator with 2" quartz lamp heater and gas shower ring.

We offers an extensive line of substrate and target manipulators as well as load lock and sample transfer systems for PLD systems. Our standard modular components can be configured in a variety of ways to meet your specific PLD system design. We can also design, integrate and certify complete PLD systems.

Typical Manipulator Specifications

 

Orientation Vertical or Horizontal
X-Y movement ±0.5" or ±1.0"
Substrate sample size <2" diameter
Targets 6 - 1" (other configurations available)
Sample orientation any
Sample heating SHQ to 700°C (water-cooled heater)
Vacuum environment UHV, O2
In-vacuum sample transfer optional
Base flange 8"

 

 


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